Methods for modifying an integrated circuit layout design

ABSTRACT

A method for modifying an integrated circuit layout design includes providing an initial multiple-patterned circuit layout design comprising a first pattern exposure and a second pattern exposure; modifying the initial multiple-patterned circuit layout design by providing a subresolution assist feature to the first pattern exposure; determining whether the presence of any overlapping areas between the subresolution assist feature of the first pattern exposure and the second pattern exposure; and further modifying the initial multiple-patterned circuit layout design by: maintaining the size of any portion of the subresolution assist feature in the overlapping areas; and shrinking the size of any portion of the subresolution assist feature that is not in the overlapping areas.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a Division of U.S. patent application Ser. No.13/955,300, filed on Jul. 31, 2013, the contents of which are herebyincorporated by reference in their entirety.

TECHNICAL FIELD

Embodiments of the present disclosure are directed to photolithographicprocessing in the design and manufacture of integrated circuits and, inparticular, to methods and systems of preparing layout data for thecreation of one or more photolithographic masks.

BACKGROUND

In conventional photolithographic processing, integrated circuits aremanufactured by exposing a pattern of features that are contained on amask or reticle onto a wafer. Light passing through the transparentportions of the mask activates light sensitive resist materials on thewafer that are then chemically and mechanically processed to create thecircuit features. The process continues building up the integratedcircuit, layer by layer.

As circuit features become increasingly small and more densely packed,optical and other process distortions occur such that the pattern offeatures on the mask does not correspond to how the features will printon the wafer. Therefore, numerous resolution enhancement techniques(RETs) have been developed to improve the ability of the mask to print adesired pattern on the wafer. One resolution enhancement technique isoptical and process correction (OPC). OPC operates by changing the maskpattern to pre-compensate for expected optical and process distortionssuch that a pattern of features printed on a wafer will match a desiredtarget layout pattern. Another resolution enhancement technique is theuse of subresolution assist features (SRAFs). Such features are smallfeatures placed on a mask or reticle that operate to improve how anadjacent mask feature prints.

It is typically desirable to use an SRAF design strategy that is “asaggressive as possible” improve the imaging quality duringphotolithography, and further to improve the pattern transfer immunityagainst photolithography process variations. FIG. 3 illustrates theprocess window precision of a via printed using fewer/smaller SRAFs(side (a)) as compared to the same via printed using more/larger SRAFs(side (b)). As shown, the process window precision is improved by about30%. It is further typically desirable to prevent SRAFs from printing.This is because, for some designs, a printing SRAF can be a defect thatcontributes to random defect generation (especially when a printing SRAFforms a resist line). Multiple stacked printing SRAFs in integratedlevels can form an actual electrical path to signals that can alter (andeven destroy) the circuit behavior. For example, an SRAF printing mightcause unintended electrical paths that can ruin the circuit, as shown inFIG. 4. Thus, the designer of a photomask faces the competing goals ofincreasing the size and density of SRAFs, while at the same timeensuring that no SRAFs print in such as manner as to result in anunintended electrical path.

Accordingly, it is desirable to provide new techniques and methods fordesigning photomasks with sub-resolution assist features. Furthermore,other desirable features and characteristics of the present disclosurewill become apparent from the subsequent detailed description and theappended claims, taken in conjunction with the accompanying drawings andthis background.

BRIEF SUMMARY OF THE INVENTION

Methods for modifying a layout design of an integrated circuit areprovided. In one embodiment, a method for modifying an integratedcircuit layout design includes providing an initial circuit layoutdesign comprising a lower metal layer, an upper metal layer, and a firstvia electrically connecting the lower metal layer to the upper metallayer. The method further includes altering the initial circuit layoutdesign by providing a second via, the second via being in electricalcontact with no more than one of the upper metal layer and the lowermetal layer, and the second via further being in proximity to the firstvia. Further, the method includes further altering the initial circuitlayout design by providing a subresolution assist feature in proximityto the second via.

In another embodiment, a method for modifying an integrated circuitlayout design includes providing an initial multiple-patterned circuitlayout design comprising a first pattern exposure and a second patternexposure, modifying the initial multiple-patterned circuit layout designby providing a subresolution assist feature to the first patternexposure, and determining whether the presence of any overlapping areasbetween the subresolution assist feature of the first pattern exposureand the second pattern exposure. The method further includes furthermodifying the initial multiple-patterned circuit layout design bymaintaining the size of any portion of the subresolution assist featurein the overlapping areas, and shrinking the size of any portion of thesubresolution assist feature that is not in the overlapping areas.

In yet another embodiment, a system for modifying an integrated circuitlayout design includes a display device, a user input device, a storagedevice, and a processor electronically and communicatively coupled tothe display device, the user input device, and the storage device. Theprocessor is configured to provide an initial circuit layout designcomprising a lower metal layer, an upper metal layer, and a first viaelectrically connecting the lower metal layer to the upper metal layer.The processor is further configured to alter the initial circuit layoutdesign by providing a second via, the second via being in electricalcontact with no more than one of the upper metal layer and the lowermetal layer, the second via further being in proximity to the first via.Still further, the processor is configured to further alter the initialcircuit layout design by providing a subresolution assist feature inproximity to the second via.

This summary is provided to introduce a selection of concepts in asimplified form that are further described below in the detaileddescription. This summary is not intended to identify key features oressential features of the claimed subject matter, nor is it intended tobe used as an aid in determining the scope of the claimed subjectmatter.

BRIEF DESCRIPTION OF THE DRAWINGS

The present invention will hereinafter be described in conjunction withthe following drawing figures, wherein like numerals denote likeelements, and wherein:

FIG. 1 illustrates an exemplary computing system that may be used toimplement various embodiments of the invention;

FIG. 2 illustrates an exemplary multi-core processor unit associatedwith the computing system shown in FIG. 1 that may be used to implementvarious embodiments of the invention;

FIGS. 3A and 3B are a simulated lithographic pattern layout illustratingthe benefits of the inclusion of SRAFs;

FIG. 4 is an illustration illustrating the problem of unintendedelectrical connections in the printing of SRAFs;

FIGS. 5 and 6 illustrate exemplary integrated circuit designs inconjunction with an exemplary photolithographic mask configuration inaccordance with certain embodiments of the present disclosure;

FIGS. 7A, 7B, and 8 illustrate certain benefits associated with anintegrated circuit design prepared in accordance with the configurationsshown in FIGS. 5 and 6;

FIGS. 9 and 10 illustrate exemplary methods for providing a lithographiclayout design in accordance with certain embodiments of the presentdisclosure;

FIGS. 11A, 11B, 12, and 13 illustrate exemplary integrated circuitdesign in conjunction with an exemplary photolithographic maskconfiguration in accordance with certain embodiments of the presentdisclosure;

FIG. 14 illustrates certain benefits associated with an integratedcircuit design prepared in accordance with the configuration shown inFIGS. 11, 12, and 13; and

FIGS. 15-18 illustrate exemplary methods for providing a lithographiclayout design in accordance with certain embodiments of the presentdisclosure.

DETAILED DESCRIPTION

The following detailed description is merely exemplary in nature and isnot intended to limit the embodiments set forth herein or theapplication and uses of the embodiments. Furthermore, there is nointention to be bound by any theory presented in the precedingbackground or the following detailed description.

Embodiments of the present disclosure are broadly directed to the designfabrication of integrated circuits, and more particularly to the designof photolithographic masks in the design and fabrication of integratedcircuits. Embodiments of the present disclosure utilize prior learningfrom process and model simulations to extrapolate dense two-dimensionalpitch patterns (especially at the edge of the array) that have areasonable process window (PW) performance with regard to precision andaccuracy in printing a target feature. This information may be used tocreate a pitch transformation from a lithographically “weak” pitch intoa litho “friendly” pitch. As used herein, the term pitch transformationrefers to the printing of extra (“dummy”) contacts or vias such that theoverall lithographic design has improved PW precision when printed. Theembodiments described herein ensure that the extra printed contacts/viasnever coincide with the metal layer above or below, which, as notedabove, could result in an undesirable device performance, for example,the formation of false electrical connections. This approach createshomogeneity in the pattern density and diffraction orders and noticeablyimproves the PW. Again, as set forth in greater detail herein, the pitchtransforming “dummy” contact/vias are never allowed to coincide withmetal layers above or below the printed layer. Pitch transforming dummycontact/vias are then treated exactly the same as regular OPCstructures, where they will receive SRAFs and further be subjected toOPC.

The execution of the various exemplary mask design processes disclosedherein may be implemented using computer-executable softwareinstructions executed by one or more programmable computing devices.Because these exemplary embodiments may be implemented using softwareinstructions, the components and operation of a generic programmablecomputer system on which various embodiments may be employed will firstbe described. Further, because of the complexity of some mask designprocesses and the large size of many circuit designs, various electronicdesign tools are configured to operate on a computing system capable ofsimultaneously running multiple processing threads. The components andoperation of a computer network having a host or master computer and oneor more remote or slave computers therefore will be described withreference to FIG. 1. This operating environment is only one example of asuitable operating environment, however, and is not intended to suggestany limitation as to the scope of use or functionality of the describedembodiments.

In FIG. 1, the computer network 101 includes a master computer 103. Inthe illustrated example, the master computer 103 is a multi-processorcomputer that includes a plurality of input and output devices 105 and amemory 107. The input and output devices 105 may include any device forreceiving input data from or providing output data to a user. The inputdevices may include, for example, a keyboard, microphone, scanner orpointing device for receiving input from a user. The output devices maythen include a display monitor, speaker, printer or tactile feedbackdevice. These devices and their connections are well known in the art,and thus will not be discussed at length here.

The memory 107 may similarly be implemented using any combination ofcomputer readable media that can be accessed by the master computer 103.The computer readable media may include, for example, non-transitorymedia such as microcircuit memory devices such as read-write memory(RAM), read-only memory (ROM), electronically erasable and programmableread-only memory (EEPROM) or flash memory microcircuit devices, CD-ROMdisks, digital video disks (DVD), or other optical storage devices. Thecomputer readable media may also include magnetic cassettes, magnetictapes, magnetic disks or other magnetic storage devices, punched media,holographic storage devices, or any other medium that can be used tostore desired information.

As will be discussed in detail below, the master computer 103 runs asoftware application for performing one or more mask design operationsaccording to various exemplary embodiments. Accordingly, the memory 107stores software instructions 109A that, when executed, will implement asoftware application for performing one or more such operations. Thememory 107 also stores data 109B to be used with the softwareapplication. In the illustrated embodiment, the data 109B containsprocess data that the software application uses to perform theoperations, at least some of which may be parallel.

The master computer 103 also includes a plurality of processor units 111and an interface device 113. The processor units 111 may be any type ofprocessor device that can be programmed to execute the softwareinstructions 109A, but will conventionally be a microprocessor device.For example, one or more of the processor units 111 may be acommercially generic programmable microprocessor. Alternately oradditionally, one or more of the processor units 111 may be acustom-manufactured processor, such as a microprocessor designed tooptimally perform specific types of mathematical operations. Theinterface device 113, the processor units 111, the memory 107 and theinput/output devices 105 are connected together by a bus 115.

In some embodiments, the master computing device 103 may employ one ormore processing units 111 having more than one processor core.Accordingly, FIG. 2 illustrates an example of a multi-core processorunit 111 that may be employed with various embodiments. As seen in thisfigure, the processor unit 111 includes a plurality of processor cores201. Each processor core 201 includes a computing engine 203 and amemory cache 205. As known to those of ordinary skill in the art, acomputing engine contains logic devices for performing various computingfunctions, such as fetching software instructions and then performingthe actions specified in the fetched instructions. These actions mayinclude, for example, adding, subtracting, multiplying, and comparingnumbers, performing logical operations such as AND, OR, NOR, and XOR,and retrieving data. Each computing engine 203 may then use itscorresponding memory cache 205 to quickly store and retrieve data and/orinstructions for execution.

Each processor core 201 is connected to an interconnect 207. Theparticular construction of the interconnect 207 may vary depending uponthe architecture of the processor unit 201. The processor cores 201communicate through the interconnect 207 with an input/output interfaces209 and a memory controller 211. The input/output interface 209 providesa communication interface between the processor unit 201 and the bus115. Similarly, the memory controller 211 controls the exchange ofinformation between the processor unit 201 and the system memory 107. Insome embodiments, the processor units 201 may include additionalcomponents, such as a high-level cache memory accessible shared by theprocessor cores 201.

While FIG. 2 shows one illustration of a processor unit 201 that may beemployed by some embodiments, it should be appreciated that thisillustration is representative only, and is not intended to be limiting.For example, some embodiments may employ a master computer 103 with oneor more cell processors. The cell processor employs multipleinput/output interfaces 209 and multiple memory controllers 211. Also,the cell processor has nine different processor cores 201 of differenttypes. More particularly, it has six or more synergistic processorelements (SPEs) and a power processor element (PPE). Each synergisticprocessor element has a vector-type computing engine 203 with 128×128bit registers, four single-precision floating point computational units,four integer computational units, and a 256 KB local store memory thatstores both instructions and data. The power processor element thencontrols that tasks performed by the synergistic processor elements.Because of its configuration, the cell processor can perform somemathematical operations, such as the calculation of fast Fouriertransforms (FFTs), at substantially higher speeds than many conventionalprocessors.

It also should be appreciated that, with some implementations, amulti-core processor unit 111 can be used in lieu of multiple, separateprocessor units 111. For example, rather than employing six separateprocessor units 111, an alternate implementation may employ a singleprocessor unit 111 having six cores, two multi-core processor units eachhaving three cores, a multi-core processor unit 111 with four corestogether with two separate single-core processor units 111, etc.

Returning now to FIG. 1, the interface device 113 allows the mastercomputer 103 to communicate with the slave computers 117A, 117B, 117C .. . 117X through a communication interface. The communication interfacemay be any suitable type of interface including, for example, aconventional wired network connection or an optically transmissive wirednetwork connection. The communication interface may also be a wirelessconnection, such as a wireless optical connection, a radio frequencyconnection, an infrared connection, or even an acoustic connection. Theinterface device 113 translates data and control signals from the mastercomputer 103 and each of the slave computers 117 into network messagesaccording to one or more communication protocols, such as thetransmission control protocol (TCP), the user datagram protocol (UDP),and the Internet protocol (IP). These and other conventionalcommunication protocols are well known in the art, and thus will not bediscussed here in more detail.

Each slave computer 117 may include a memory 119, a processor unit 121,an interface device 122, and, optionally, one more input/output devices125 connected together by a system bus 127. As with the master computer103, the optional input/output devices 125 for the slave computers 117may include any conventional input or output devices, such as keyboards,pointing devices, microphones, display monitors, speakers, and printers.Similarly, the processor units 121 may be any type of conventional orcustom-manufactured programmable processor device. For example, one ormore of the processor units 121 may be commercially generic programmablemicroprocessors. Alternately, one or more of the processor units 121 maybe custom-manufactured processors, such as microprocessors designed tooptimally perform specific types of mathematical operations. Stillfurther, one or more of the processor units 121 may have more than onecore, as described with reference to FIG. 2 above. For example, withsome implementations of the invention, one or more of the processorunits 121 may be a cell processor. The memory 119 then may beimplemented using any combination of the computer readable mediadiscussed above. Like the interface device 113, the interface devices123 allow the slave computers 117 to communicate with the mastercomputer 103 over the communication interface.

In the illustrated example, the master computer 103 is a multi-processorunit computer with multiple processor units 111, while each slavecomputer 117 has a single processor unit 121. It should be noted,however, that alternate embodiments may employ a master computer havingsingle processor unit 111. Further, one or more of the slave computers117 may have multiple processor units 121, depending upon their intendeduse, as previously discussed. Also, while only a single interface device113 or 123 is illustrated for both the master computer 103 and the slavecomputers, it should be noted that, with alternate embodiments, eitherthe computer 103, one or more of the slave computers 117, or somecombination of both may use two or more different interface devices 113or 123 for communicating over multiple communication interfaces.

In some embodiments, the master computer 103 may be connected to one ormore external data storage devices. These external data storage devicesmay be implemented using any combination of computer readable media thatcan be accessed by the master computer 103. The computer readable mediamay include, for example, non-transitory microcircuit memory devicessuch as read-write memory (RAM), read-only memory (ROM), electronicallyerasable and programmable read-only memory (EEPROM) or flash memorymicrocircuit devices, CD-ROM disks, digital video disks (DVD), or otheroptical storage devices. The computer readable media may also includemagnetic cassettes, magnetic tapes, magnetic disks or other magneticstorage devices, punched media, holographic storage devices, or anyother medium that can be used to store desired information. According tosome implementations, one or more of the slave computers 117 mayalternately or additionally be connected to one or more external datastorage devices. Typically, these external data storage devices willinclude data storage devices that also are connected to the mastercomputer 103, but they also may be different from any data storagedevices accessible by the master computer 103.

Computer network 101 may be employed to generate a lithographic maskdesign for process yield improvement as will be described in greaterdetail below.

FIG. 5. Illustrates an integrated circuit layout design including aplurality of pitch transforming “dummy” vias. As shown therein, twometal layers 501 and 502 are provided, with layer 502 being providedabove layer 501. The layout design requires a plurality of vias 503 toconnect the metal layers 501 and 502. In order to improve the processwindow of the layout design when printed, FIG. 5 illustrates that aplurality of “dummy” vias 504 are printed in proximity to the “true”vias 503 Importantly, the extra dummy vias 504 are allowed to print onlyin the regions where both metal layer 501 and metal layer 502 are notpresent. Thus, this embodiment represents a “conservative” approach toensure that no false electrical connections are created by the presenceof the dummy vias 504.

FIG. 6 represents a further embodiment of an integrated circuit layoutdesign including a plurality of pitch transforming dummy vias. As showntherein, resolution is enhanced by printing the dummy vias 504 inregions where both metal layer 501 and metal layer 502 are not present,in addition to areas where only lower metal layer 501 is present. Nodummy vias are printed in regions 601 where only the upper metal layer502 is present. Thus, this embodiment represents another conservativeapproach to ensure that no false electrical connections are created bythe presence of the dummy vias 504. This embodiment is particularlyuseful in the context of a self-aligned via (SAV) process flow.

FIG. 7 is another exemplary layout design provided to illustrate thebenefits of printing pitch transforming dummy vias 504. Between layout(a1), which does not include the dummy vias 504, and layout (a2), whichincludes dummy vias 504 in regions where both metal layers 501 and 502are not present, it is shown that the printing accuracy of the true vias503 is improved by over 40%. Further illustrated in FIG. 7, layout (b)is a design that cannot be transformed by the printing of dummy vias, asthere are no available regions to print the dummy vias that will ensurethat no false electrical connections are formed. FIG. 8 furtherillustrates the benefits of the inclusion of dummy vias, in the contextof a pattern printed with only the aide of SRAFs versus a patternprinted with SRAFs and the dummy vias described above. Here, the benefitis about 20% improved accuracy, as shown.

A method for generating a layout design in accordance with the presentdisclosure is provided in FIG. 9, along with illustrative layoutfeatures at each step in the method. The method begins with steps 901,902, and 903, where the configuration for each layer of the design isprovided to the pitch transforming system. As shown at step 901, theinitial configuration for the upper metal layer 910 is provided; asshown at step 902, the initial configuration for the via 920 isprovided, and as shown at step 903, the initial configuration for thelower metal layer 930 is provided. At steps 904, 905, and 906, theappropriate biases and errors are applied to each layer 910, 920, and930, to generate a corrected upper metal layer 911, a corrected via 921,and a corrected lower metal layer 931. With the layers of the designbeing now provided and corrected for biases and errors, safe pitchtransforming vias 950 may be added, at step 907, in the regions whereneither layers 911 nor 931 are present to transform the pitch andimprove the accuracy of the true via 921.

An alternative method for generating a layout design in accordance withthe present disclosure is provided in FIG. 10, along with illustrativelayout features at each step in the method. The method begins with steps1001 and 1002, as in FIG. 9, with providing an initial configuration forthe upper metal layer (1010), lower metal layer (1020), and vias (1030).In this method, the upper metal layer 1010 and the lower metal layer1020 serve as “blocking markers” for determining areas where dummy viasshould not be provided, as shown in connection with step 1003.Thereafter, at step 1004, based on the pattern of vias (1030), variousdummy via combinations (1050) are provided that match the designpattern. Various exemplary options 1 through 3 are provided in FIG. 10.Thereafter, the blocking markers are compared against the exemplarydummy via combinations, and dummy vias 1050 that would print over theblocking markers 1010, 1020 are removed, as shown in step 1005, togenerate a final design layout.

As such, the presently described method redesigns the proximity aroundthe contact/vias into a more lithography friendly pitch pattern (wherethe diffraction pattern better matches with the used illumination). There-design methodology is based on three basic steps after theidentification of non-friendly pitches: identifying the possible pitchesthat the current pitch can transform into; identifying the safe regionsfor the printing assisting features based on the metals above and below;and re-designing the proximity based on the safest and most PW improvingsurrounding proximity The decision is based on PW improvement and theprevention of making any false circuit connections, as well as anyreliability issues that can appear.

A further embodiment of the present disclosure is now provided inconnection with FIG. 11 et seq. As shown therein, pitch transformingmethodologies can be applied to double- or multiple-patterninglithography technologies. In double/multiple-patterning technologies,the generated SRAFs of each of the exposures are totally independentfrom the other exposures. This means that technically the solution ofeach exposure during the OPC flow is almost as if it is a singleexposure mask. In many situations, some of the SRAFs of one of theexposures may coincide with one or more of the main patterns of thesecond exposure, which technically means that there will be noreliability problem if these SRAFs completely print (as long as theirprinting is bounded by the other exposure critical dimensions (CD)). Thepresently described embodiment this concept to improve the PWperformance during optical lithography by allowing printing SRAFs thatare bounded by the other exposure(s) CD.

Referring now particularly to FIG. 11, part (a) illustrates a layoutdesign for triple-patterned metal layer printing exposures (E1, E2, andE3), and part (b) illustrates a layout design for a double-patternedvia/contact printing exposures (E1 and E2). In each case, pattern E1includes an SRAF feature that overlaps the metal layer/via design ofanother pattern. Thus, FIG. 11 shows that SRAFs bounded by otherexposures of the same level are allowed to be larger and print as theyhave no risk on the final design even if they transfer through the etchbecause the align with the original design. Likewise, FIGS. 12 and 13illustrate an exemplary layout design having two exposures E1 and E2.FIG. 12 shows the original designs, whereas FIG. 13 shows the modifieddesign after the overlapping SRAFs are allowed to grow and print wherethey coincide with the other exposure. The non-printing(non-overlapping) SRAFs, as shown, are not allowed to print.Furthermore, FIG. 14 shows the benefit in accuracy of printing achievedby allowing the extra printing of SRAFs in overlapping regions betweenexposures.

A method for generating a layout design in accordance with the presentdisclosure is provided in FIG. 9, along with illustrative layoutfeatures at each step in the method. The method begins with steps 1501and 1502, which include providing the layout design for the variousexposures in a double- or multiple-level patterning layout, includingfor example E1 and E2 targets, as shown. Lithography and etch biases areapplied at step 1503 to account for any printing errors, and an SRAFpattern is provided around the target E1 at step 1504. Finally, at step1505, the layouts from each exposure are combined, and overlapping SRAFsare allowed to print, whereas non-overlapping SRAFs are not.

Various alternatives exist for performing step 1505. Three exemplaryembodiments are provided herein in FIGS. 16, 17, and 18, respectively.Turning first to the exemplary embodiment shown in FIG. 16, step 1505may be performed by comparing the various E1, E2, etc. exposure layoutsin a SRAF print avoidance (SPA) simulation. The simulation determines,at step 1602, whether, for example, the E1 SRAFs are within the E2target area, as shown. If yes, the SRAF is retained at its originaldesign size, as shown at step 1603. If, however, as shown at step 1604,the E1 SRAF is not within an E2 target, the SRAF size is shrunk toprevent printing thereof. In this manner, the SPA simulation is runwhile using the E2 lithography targets as “ignore printing markers” suchthe print avoidance simulation ignores the SRAFs therewithin.

Turning now to the second exemplary embodiment shown in FIG. 17, step1505 may be performed by merely overlaying the E1 (for example) SRAFsover the E2 target areas, as shown at step 1701. Thereafter, at step1702, any E1 SRAFs found to be within the E2 lithography targets areexcluded from the SPA simulation. The result is that non-overlapping E1SRAFs will shrink to prevent printing, and those overlapping with an E2target will not shrink, as shown in FIG. 17. In this manner, the SPAsimulation is run while the E2 lithography targets are used to identifyE1 SRAF edges that will not be considered for SPA correction.

Turning now to the third exemplary embodiment shown in FIG. 18, step1505 may be performed as indicated above with regard to FIG. 17 (steps1801 and 1802 corresponding to 1701 and 1702, respectively) except thatthis method employs shape manipulation, as shown, to slightly modify theE1 SRAF configuration to overlay with the E2 target areas. IF SRAFs canbe slightly modified to align with other exposure targets such thatreplacing the SRAF with a modified version thereof, the PW window willbe improved.

As such, the presently described embodiment provides a method whereinSRAFs can be slightly altered into much more “aggressive” SRAFs to allowbetter PW as long as they are printing within the other exposure targetsin the context of a multiple pattern layout. Three techniques areprovided to achieve this benefit: using aggressive SRAFs and ignoringprinting within the other exposure's target during SPA; using aggressiveSRAFs and using the other exposure's target to identify SRAF edges thatwill not be considered during SPA; and generating aggressive SRAFs thenaltering them to align and resize around the other exposure's target.

While at least one exemplary embodiment has been presented in theforegoing detailed description of the invention, it should beappreciated that a vast number of variations exist. It should also beappreciated that the exemplary embodiment or exemplary embodiments areonly examples, and are not intended to limit the scope, applicability,or configuration of the disclosure in any way. Rather, the foregoingdetailed description will provide those skilled in the art with aconvenient road map for implementing an exemplary embodiment, it beingunderstood that various changes may be made in the function andarrangement of elements described in an exemplary embodiment withoutdeparting from the scope of the disclosure as set forth in the appendedclaims and their legal equivalents.

What is claimed is:
 1. A method for modifying an integrated circuitlayout design, the method comprising: providing an initialmultiple-patterned circuit layout design comprising a first patternexposure and a second pattern exposure; modifying the initialmultiple-patterned circuit layout design by providing a subresolutionassist feature to the first pattern exposure; determining whether thepresence of any overlapping areas between the subresolution assistfeature of the first pattern exposure and the second pattern exposure;and further modifying the initial multiple-patterned circuit layoutdesign by: maintaining the size of any portion of the subresolutionassist feature in the overlapping areas; and shrinking the size of anyportion of the subresolution assist feature that is not in theoverlapping areas.
 2. The method of claim 1, wherein the initialmultiple-patterned circuit layout design further comprises a thirdpattern exposure.
 3. The method of claim 1, wherein the second patternexposure comprises a metal layer, and wherein the subresolution assistfeature overlaps the metal layer.
 4. The method of claim 1, wherein thesecond pattern exposure comprises a via, and wherein the subresolutionassist feature overlaps the via.
 5. The method of claim 1, furthercomprising photolithographically printing the first pattern exposure,the second pattern exposure, and the overlapping areas of thesubresolution assist feature, but not printing the shrunkennon-overlapping areas of the subresolution assist feature.
 6. The methodof claim 1, further comprising adjusting the position of thesubresolution assist feature so as to fully overlap the second patternexposure.
 7. The method of claim 1, further comprising applying a biasto modify the initial multiple-patterned circuit layout design.